Photo Alignment Materials with High Sensitivity to Near UV Light.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Makita, Yutaka; Natsui, Toru; Kimura, Shin-ichi; Nakata, Shoichi; Kimura, Masayuki; Matsuki, Yasuo; Takeuchi, Yasumasa
- 卷第11卷
- 期第2期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小351.54KB
- 发表时间1998
- DOI10.2494/photopolymer.11.187
- 页码187-192
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