Single-Crystalline CoSi 2 Layer Formation by Focused Ion Beam Synthesis
- 期刊名称Japanese Journal of Applied Physics
- 作者Hausmann, Stephan; Bischoff, Lothar; Teichert, Jochen; Voelskow, Matthias; Möller, Wolfhard
- 卷第38卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小540.01KB
- 发表时间1999-12-30
- DOI10.1143/JJAP.38.7148
- 页码7148-7150
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