Dependence of deposition characteristics by copper chemical vapor deposition on gas flow shape
- 作者Akiko Kobayashi; Atsushi Sekiguchi; Kei Ikeda; Osamu Okada; Tomoaki Koide
- 卷第83卷
- 期第6期
- 印刷ISSN8756-663X
- 电子ISSN1520-6432
- 文件大小531.17KB
- 发表时间2000
- DOI10.1002/(sici)1520-6432(200006)83:6<1::aid-ecjb1>3.0.co;2-7
- 页码1-7
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