![Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor]()
Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitorJinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi; Momose, Hikaru; Samukawa, Seiji · Journal of Physics D: Applied Physics · 2010