Microlithography Using Metastable Helium Atoms: Patterning of Gold Film Coated with Dodecanethiol Self-Assembled Monolayers on Mica
- 期刊名称Japanese Journal of Applied Physics
- 作者Ju, Xin; Kurahashi, Mitsunori; Suzuki, Taku; Yamauchi, Yasushi
- 卷第42卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1319.60KB
- 发表时间2003-7-30
- DOI10.1143/JJAP.42.4767
- 页码4767-4769
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