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Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1−xCx:H after ultraviolet treatment in an Argon ambient

Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1−xCx:H after ultraviolet treatment in an Argon ambient

Seung Yeop Myong; Sang Soo Kim; Koeng Su Lim
  • 作者Seung Yeop Myong; Sang Soo Kim; Koeng Su Lim
  • 印刷ISSN0040-6090
  • 文件大小250.57KB
  • 发表时间2004
  • DOI10.1016/j.tsf.2004.01.018
  • 页码482-485
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