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Improvement of TiN Flow Modulation Chemical Vapor Deposition from TiCl
<sub/>4</sub>
and NH
<sub/>3</sub>
by Introducing Ar Purge Time

Improvement of TiN Flow Modulation Chemical Vapor Deposition from TiCl ₄ and NH ₃ by Introducing Ar Purge Time

Jun, Keeyoung; Im, Ik-Tae; Shimogaki, Yukihiro

期刊名称Japanese Journal of Applied Physics
作者Jun, Keeyoung; Im, Ik-Tae; Shimogaki, Yukihiro
卷第43卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小304.84KB
发表时间2004-4-9
DOI10.1143/JJAP.43.1619
页码1619-1624

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