Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films
- 作者O. Brunkahl; W. Bock; K. Thoma; B.O. Kolbesen
- 卷第252卷
- 期第1期
- 印刷ISSN0169-4332
- 文件大小448.92KB
- 发表时间2005
- DOI10.1016/j.apsusc.2005.02.015
- 页码177-184
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