Iodine Solid Source Inductively Coupled Plasma Etching of InP
- 期刊名称Japanese Journal of Applied Physics
- 作者Matsutani, Akihiro; Ohtsuki, Hideo; Koyama, Fumio
- 卷第44卷
- 印刷ISSN0021-4922
- 文件大小421.04KB
- 发表时间2005-4-22
- DOI10.1143/JJAP.44.L576
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