Interface Resistivity of Directly Bonded Si Wafers
- 期刊名称Japanese Journal of Applied Physics
- 作者Kanno, Ikuo; Yamashita, Makoto; Nomiya, Seiichiro; Onabe, Hideaki
- 卷第45卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小307.63KB
- 发表时间2006-10-6
- DOI10.1143/JJAP.45.7938
- 页码7938-7943
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