Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists
- 期刊名称Japanese Journal of Applied Physics
- 作者Kozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Itani, Toshiro
- 卷第47卷
- 期第7期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小375.57KB
- 发表时间2008-7-11
- DOI10.1143/JJAP.47.5404
- 页码5404-5408
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