A replacement of high- k process for CMOS transistor by atomic layer deposition
- 期刊名称Semiconductor Science and Technology
- 作者Han, Jin-Woo; Choi, Byung Joon; Yang, J Joshua; Moon, Dong-Il; Choi, Yang-Kyu; Williams, R Stanley; Meyyappan, M
- 卷第28卷
- 期第8期
- 印刷ISSN0268-1242
- 电子ISSN1361-6641
- 文件大小367.45KB
- 发表时间2013-08-01
- DOI10.1088/0268-1242/28/8/082003
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