Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process
- 期刊名称Japanese Journal of Applied Physics
- 作者Ootera, Yasuaki; Sugawara, Katsuya; Kanamaru, Masahiro; Yamamoto, Ryousuke; Kawamonzen, Yoshiaki; Kihara, Naoko; Kamata, Yoshiyuki; Kikitsu, Akira
- 卷第52卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小89.82KB
- 发表时间2013-10-01
- DOI10.7567/jjap.52.105201
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