The effect of substrate holder size on the electric field and discharge plasma on diamond-film formation at high deposition rates during MPCVD
AN, Kang; CHEN, Liangxian; LIU, Jinlong; ZHAO, Yun; YAN, Xiongbo; HUA, Chenyi; GUO, Jianchao; WEI, Junjun; HEI, Lifu; LI, Chengming; LU, Fanxiu
- 期刊名称Plasma Science and Technology
- 作者AN, Kang; CHEN, Liangxian; LIU, Jinlong; ZHAO, Yun; YAN, Xiongbo; HUA, Chenyi; GUO, Jianchao; WEI, Junjun; HEI, Lifu; LI, Chengming; LU, Fanxiu
- 卷第19卷
- 期第9期
- 印刷ISSN1009-0630
- 文件大小2316.08KB
- 发表时间2017-09-01
- DOI10.1088/2058-6272/aa7458