![SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Revisiting mask contact hole measurements]()
SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Revisiting mask contact hole measurementsHiguchi, Masaru; Martin, Patrick M.; Naber, Robert J.; Gallagher, Emily; Ceperley, Daniel; Brunner, Timothy; Bowley, Reg; McGuire, Anne · 2006