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In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD

In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD

von Fieandt, Kristina; Johansson, Fredrik O. L.; Balmes, Olivier; Lindblad, Rebecka; Riekehr, Lars; Lindblad, Andreas; Lewin, Erik
  • 期刊名称Inorganic Chemistry
  • 作者von Fieandt, Kristina; Johansson, Fredrik O. L.; Balmes, Olivier; Lindblad, Rebecka; Riekehr, Lars; Lindblad, Andreas; Lewin, Erik
  • 卷第58卷
  • 期第16期
  • 印刷ISSN0020-1669
  • 电子ISSN1520-510X
  • 文件大小7910.99KB
  • 发表时间2019-08-19
  • DOI10.1021/acs.inorgchem.9b01631
  • 页码11100-11109
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