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[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || PREFACEThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || SUBJECT INDEXThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || AUTHOR INDEXThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Laser-Induced PolymerizationThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Fundamental Limits of LithographyThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Organic Direct Optical Recording MediaThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Radiation Stability of Silicon ElastomersThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Practical and Fundamental Aspects of LithographyThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985