![SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Pattern inspection of EUV mask using an EUV microscope]()
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Pattern inspection of EUV mask using an EUV microscopeWatanabe, Takeo; Tanabe, Hiroyoshi; Haga, Tsuneyuki; Shoki, Tsutomu; Hamamoto, Kazuhiro; Takada, Shintaro; Kazui, Naoki; Kakunai, Satoshi; Tsubakino, Harushige; Kinoshita, Hiroo · 2003