Aqueous phase silylation a new route to plasma developable high resolution resists
- 作者R. Sezi; R. Leuschner; M. Sebald; H. Ahne; S. Birkle; H. Borndörfer
- 卷第11卷
- 印刷ISSN0167-9317
- 文件大小303.67KB
- 发表时间1990
- DOI10.1016/0167-9317(90)90165-p
- 页码535-538
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