[ACS Symposium Series] Supercritical Fluid Technology Volume 488 (Theoretical and Applied Approaches to Analytical Chemistry) || Relative Effect of Experimental Variables
- 作者Bright, Frank V.; McNally, Mary Ellen P.
- 文件大小1512.84KB
- 发表时间1992
- DOI10.1021/bk-1992-0488.ch017
- 页码237-250
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || PREFACEThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || SUBJECT INDEXThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || AUTHOR INDEXThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Laser-Induced PolymerizationThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Fundamental Limits of LithographyThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Organic Direct Optical Recording MediaThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Radiation Stability of Silicon ElastomersThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985
[ACS Symposium Series] Materials for Microlithography Volume 266 (Radiation-Sensitive Polymers) || Practical and Fundamental Aspects of LithographyThompson, L. F.; Willson, C. G.; Fréchet, J. M. J. · 1985