![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Novel resist for replica preparation of mold for imprint lithography]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Novel resist for replica preparation of mold for imprint lithographyMatsukawa, Daisaku; Henderson, Clifford L.; Wakayama, Hiroyuki; Mitsukura, Kazuyuki; Okamura, Haruyuki; Hirai, Yoshihiko; Shirai, Masamitsu · 2009