Investigation on the Thermal and Electrical Properties of Ti-Si-O Film Formed by the Composite Sputtering Deposition
- 期刊名称MRS Proceedings
- 作者Nishiyama, Akira; Kaneko, Akio; Koyama, Masato; Kamata, Yoshiki; Fujiwara, Ikuo; Koike, Masahiro; Yoshiki, Masahiko; Koike, Mitsuo
- 卷第670卷
- 电子ISSN1946-4274
- 文件大小3658.22KB
- 发表时间2001-1
- DOI10.1557/proc-670-k4.8
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