![SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - <title>Phenolic molecular glasses as resists for next-generation lithography</title>]()
SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - <title>Phenolic molecular glasses as resists for next-generation lithography</title>André, Xavier; Lee, Jin Kyun; De Silva, Anuja; Felix, Nelson; Ober, Christopher K.; Cao, Heidi B.; Deng, Hai; Kudo, Hiroto; Watanabe, Daisuke; Nishikubo, Tadatomi; Lin, Qinghuang · 2007