SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - <title>Development of critical dimension measurement scanning electron microscope for ULSI (S-8000 series)</title>Ezumi, Makoto; Otaka, Tadashi; Mori, Hiroyoshi; Todokoro, Hideo; Ose, Yoichi; Jones, Susan K. · 1996

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation - Denver, CO (Sunday 4 August 1996)] Wavelet Applications in Signal and Image Processing IV - <title>Lossless compression of medical images based on an enhanced generalized multidimensional S-Transform</title>Aiazzi, Bruno; Alba, Pasquale S.; Alparone, Luciano; Baronti, Stefano; Lotti, Franco; Unser, Michael A.; Aldroubi, Akram; Laine, Andrew F. · 1996

SPIE Proceedings [SPIE Second International Conference on Optical Information Processing - St. Petersburg, Russia (Monday 17 June 1996)] Second International Conference on Optical Information Processing - <title>Digital fiber optic communication system with 486-Mb/s digit rate</title>Sergeevich, Karinsky S.; Petrovna, Prokofieva L.; Natanovich, Lurie M.; Alferov, Zhores I.; Gulyaev, Yuri V.; Pape, Dennis R. · 1996

SPIE Proceedings [SPIE Third International Workshop on Laser Beam and Optics Characterization - Quebec City, Canada (Monday 8 July 1996)] Third International Workshop on Laser Beam and Optics Characterization - <title>S on 1 laser damage measurements on CO<formula><inf><roman>2</roman></inf></formula>-laser optics: defect- and stress-induced damage</title>Plass, Wilfried; Giesen, Adolf; Morin, Michel; Giesen, Adolf · 1996

SPIE Proceedings [SPIE International Conference on Advanced Optical Materials and Devices - Riga, Latvia (Monday 26 August 1996)] Optical Organic and Semiconductor Inorganic Materials - <title>Quantum chemical calculations, synthesis, and properties of novel organic molecules with photo-induced intramolecular electron transfer and giant change of the electric dipole moment in the exited s</title>Neilands, Ojars; Utinans, Maris; Silinsh, Edgar A.; Medvids, Arthur; Lusis, Andrejs R.; Ozols, Andris O. · 1997

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - <title>Resist and etched line profile characterization using scatterometry</title>Raymond, Christopher J.; Naqvi, S. Sohail H.; McNeil, John R.; Jones, Susan K. · 1997

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - <title>Multiparameter CD measurements using scatterometry</title>Raymond, Christopher J.; Murnane, Michael R.; Prins, Steven L.; Naqvi, S. Sohail H.; McNeil, John R.; Hosch, Jimmy W.; Jones, Susan K. · 1996