![Properties of C[sub 4]F[sub 8] inductively coupled plasmas. I. Studies of Ar/c-C[sub 4]F[sub 8] magnetically confined plasmas for etching of SiO[sub 2]]()
Properties of C[sub 4]F[sub 8] inductively coupled plasmas. I. Studies of Ar/c-C[sub 4]F[sub 8] magnetically confined plasmas for etching of SiO[sub 2]Li, Xi; Ling, Li; Hua, Xuefeng; Oehrlein, Gottlieb S.; Wang, Yicheng; Vasenkov, Alex V.; Kushner, Mark J. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2004