In situ chemical sensing in AlGaN∕GaN metal organic chemical vapor deposition process for precision film thickness metrology and real-time advanced process control
- 作者S. Cho; D. S. Janiak; G. W. Rubloff; M. E. Aumer; D. B. Thomson; D. P. Partlow
- 文件大小865.77KB
- 发表时间2005
- DOI10.1116/1.2037707
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