![[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Electromigration of submicron Damascene copper interconnects]()
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Electromigration of submicron Damascene copper interconnectsChangsup Ryu, ; Kee-Won Kwon, ; Loke, A.L.S.; Dubin, V.M.; Kavari, R.A.; Ray, G.W.; Wong, S.S. · 1998