Cointegration Detection Using Dynamic Factor Models
- 期刊名称Communications in Statistics - Simulation and Computation
- 作者Fukuda, Kosei
- 卷第37卷
- 期第1期
- 印刷ISSN0361-0918
- 电子ISSN1532-4141
- 文件大小264.81KB
- 发表时间2007-12-31
- DOI10.1080/03610910701723997
- 页码143-153
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (1998.06.9-1998.06.11)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No 98CH36216) VLSIT-98 - 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216)1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (1998.06.9-1998.06.11)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No 98CH36216) VLSIT-98 - Author index1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (1998.06.9-1998.06.11)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No 98CH36216) VLSIT-98 - Table of contents1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Lithography solutions for sub-0.1 μm generationsSasago, M. · 1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Chemical mechanical polishing: the impact of a new technology on an industryPerry, K.A. · 1998
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[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Highly robust ultra-thin gate dielectric for giga scale technologyKhare, M.; Wang, X.W.; Ma, T.P. · 1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Electromigration of submicron Damascene copper interconnectsChangsup Ryu, ; Kee-Won Kwon, ; Loke, A.L.S.; Dubin, V.M.; Kavari, R.A.; Ray, G.W.; Wong, S.S. · 1998