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Silicon etching in Cl2 environmentR. Knizikevičius · 2006
Simulation of inverse reactive ion etching lagR. Knizikevičius · 2003
Simulation of silicon etching through a fluorocarbon layerR. Knizikevičius · 2005
Comparison of methods for deriving desorption activation energyKnizikevičius, R. · Vacuum · 2015
Anisotropic etching of silicon in SF6 plasmaR. Knizikevičius; V. Kopustinskas · 2004
Evaluation of desorption activation energy of SiF2 moleculesR. Knizikevičius · 2005
Evaluation of desorption activation energy of SiCl2 moleculesR. Knizikevičius · 2003