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- 作者Thomas C. Wright Jr; L. Stewart Massad; Charles J. Dunton; Mark Spitzer; Edward J. Wilkinson; Diane Solomon
- 卷第199卷
- 期第3期
- 印刷ISSN0002-9378
- 电子ISSN1097-6868
- 文件大小45.96KB
- 发表时间2008
- DOI10.1016/j.ajog.2008.03.061
Study of mechanisms involved in photoresist microlens formationS. Audran; B. Faure; B. Mortini; J. Regolini; G. Schlatter; G. Hadziioannou · 2006
Dynamical formation of microlenses by the reflow method: numerical simulation and experimental study of the process fabricationS. Audran; B. Mortini; B. Faure; G. Schlatter · 2010
Leaching mechanisms in immersion lithography with or without top coatS. Gaugiran; R. Feilleux; C. Sourd; S. Warrick; V. Farys; D. Cruau; M. Benndorf; B. Mortini · 2007
Properties and mutual interactions of various acrylate monomers used in 193 nm resistsP.J. Paniez; F. Perrier; M. Panabiere; B. Mortini; C. Rosilio · 1999
Extensive thermal characterization of advanced resists by Modulated Temperature DSC (MT-DSC): Application to acrylate based 193 nm resistsP.J. Paniez; J-A. Guinot; B. Mortini; C. Rosilio · 1998
SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Resist evaluation for contact hole patterning with thermal flow processTiron, R.; Lin, Qinghuang; Petitdidier, C.; Sourd, C.; De Simone, D.; Cotti, G.; Annoni, E.; Mortini, B. · 2007