![SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source]()
SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation sourceYoshioka, Nobuyuki; Fujino, Takahiro; Tanaka, Yusuke; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo; Kinoshita, Hiroo · 2015