![[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Barriermetal-less interconnect with low-k organic film]()
[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Barriermetal-less interconnect with low-k organic filmMaeda, Nobuhide; Takimoto, Yoshio; Sakamoto, Yoshinori; Tada, Masahiro; Nakajima, Michio; Funatsu, Keisuke · 2007