![Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications]()
Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor ApplicationsKim, Wan Don; Hwang, Gyu Weon; Kwon, Oh Seong; Kim, Seong Keun; Cho, Moonju; Jeong, Doo Seok; Lee, Sang Woon; Seo, Min Ha; Hwang, Cheol Seong; Min, Yo-Sep; Cho, Young Jin · Journal of The Electrochemical Society · 2005