Polymerization of Self-Organized Diacetylene Derivatives
- 期刊名称Kobunshi
- 作者TAMAOKI, Nobuyuki
- 卷第55卷
- 期第8期
- 印刷ISSN0454-1138
- 电子ISSN2185-9825
- 文件大小2769.97KB
- 发表时间2006
- DOI10.1295/kobunshi.55.611
- 页码611-615
Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal ProcessOotera, Yasuaki; Sugawara, Katsuya; Kanamaru, Masahiro; Yamamoto, Ryousuke; Kawamonzen, Yoshiaki; Kihara, Naoko; Kamata, Yoshiyuki; Kikitsu, Akira · Japanese Journal of Applied Physics · 2013
High-purity cobalt thin films with perpendicular magnetic anisotropy prepared by chemical vapor depositionOotera, Yasuaki; Shimada, Takuya; Kado, Masaki; Quinsat, Michael; Morise, Hirofumi; Nakamura, Shiho; Kondo, Tsuyoshi · Applied Physics Express · 2015
Orientation and Position Control of Self-Assembled Polymer Pattern for Bit-Patterned MediaYamamoto, Ryousuke; Kanamaru, Masahiro; Sugawara, Katsuya; Sasao, Norikatsu; Ootera, Yasuaki; Okino, Takeshi; Kihara, Naoko; Kamata, Yoshiyuki; Kikitsu, Akira · IEEE Transactions on Magnetics · 2014
Nanoimprint Mold for 2.5 Tbit/in.$^{2}$ Directed Self-Assembly Bit Patterned Media with Phase Servo PatternYamamoto, Ryousuke; Yuzawa, Akiko; Shimada, Takuya; Ootera, Yasuaki; Kamata, Yoshiyuki; Kihara, Naoko; Kikitsu, Akira · Japanese Journal of Applied Physics · 2012
Fabrication of 5 Tdot/in.2 bit patterned media with servo pattern using directed self-assemblyKihara, Naoko; Yamamoto, Ryousuke; Sasao, Norikatsu; Shimada, Takuya; Yuzawa, Akiko; Okino, Takeshi; Ootera, Yasuaki; Kamata, Yoshiyuki; Kikitsu, Akira · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 2012
Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)Sasao, Norikatsu; Yamamoto, Ryosuke; Kihara, Naoko; Shimada, Takuya; Yuzawa, Akiko; Okino, Takashi; Ootera, Yasuaki; Kawamonzen, Yoshiaki; Hieda, Hiroyuki; Maeda, Tomoyuki; Kamata, Yoshiyuki; Akitsu, Akira · Journal of Photopolymer Science and Technology · 2012
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Nanoimprint process for 2.5Tb/in <sup>2</sup> bit patterned media fabricated by self-assembling methodOotera, Yasuaki; Herr, Daniel J. C.; Yuzawa, Akiko; Shimada, Takuya; Yamamoto, Ryousuke; Kamata, Yoshiyuki; Kihara, Naoko; Kikitsu, Akira · 2011
Chemical Stress RelaxationKobunshi · 1963
Urethane Forming ReactionIWAKURA, Yoshio · Kobunshi · 1964
Molecular Vibratian of Irregular ChainsTASUMI, Mitsuo · Kobunshi · 1964
Alkali Treatment of Polynosic FibreTUBAKI, Sigeo · Kobunshi · 1964
Water Proofing Treatment of Cellulose TextileNAKAI, Shinzo · Kobunshi · 1964
Printing and Printing In for Metals.ENYA, Tsutomu; SAKAI, Kazuo · Kobunshi · 1964
Initiators of Free Radical PolymerizationMINATO, Hiroshi · Kobunshi · 1964
Recent Progress of“Living Polymer”HIBAOKA, Michio · Kobunshi · 1964