![Characteristics of Mixed Oxides and Nanolaminates of Atomic Layer Deposited HfO[sub 2]–TiO[sub 2] Gate Dielectrics]()
Characteristics of Mixed Oxides and Nanolaminates of Atomic Layer Deposited HfO[sub 2]–TiO[sub 2] Gate DielectricsTriyoso, D. H.; Hegde, R. I.; Wang, X.-D.; Stoker, M. W.; Rai, R.; Ramon, M. E.; White, B. E.; Tobin, P. J. · Journal of The Electrochemical Society · 2006