![Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon films]()
Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon filmsValentini, L.; Kenny, J. M.; Montereali, R. M.; Lozzi, L.; Santucci, S. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2002