![Low-Temperature Growth of Thin Films of Al
<sub/>2</sub>
O
<sub/>3</sub>
by Sequential Surface Chemical Reaction of trimethylaluminum and H
<sub/>2</sub>
O
<sub/>2</sub>]()
Low-Temperature Growth of Thin Films of Al
<sub/>2</sub>
O
<sub/>3</sub>
by Sequential Surface Chemical Reaction of trimethylaluminum and H
<sub/>2</sub>
O
<sub/>2</sub>Fan, Jia-Fa; Sugioka, Koji; Toyoda, Koichi · Japanese Journal of Applied Physics · 1991