SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>0.5-μm optical mask process for 364-nm scanned laser lithography</title>Buck, Peter D.; Pol, Victor · 1990

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>0.10-μm overlay for DRAM production using step and scan</title>Sewell, Harry; Smith, Scott J.; Galburt, Daniel N.; Pol, Victor · 1990

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>New indexes of the 0.5-μm resolution resist for optical lithography</title>Sugimoto, Aritoshi; Ito, Tetsuo; Okano, Sadao; Nozaki, Masahiro; Kato, Takeshi; Suko, Kazuyuki; Tsunematsu, Masayasu; Kadota, Kazuya; Pol, Victor · 1990

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>0.5-μm photolithography using high-numerical-aperture I-line wafer steppers</title>Arnold, William H.; Minvielle, Anna Maria; Phan, Khoi A.; Singh, Bhanwar; Templeton, Michael K.; Pol, Victor · 1990

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>Simulation and experimental results in O.6-μm lithography using an I-line stepper</title>Bauer, Joachim J.; Mehr, Wolfgang; Glaubitz, Ulrich; Baborski, H.; Haase, Norbert; Mueller, Jens-Ullrich; Pol, Victor · 1990