Molecular simulation of film growth rate in the low-pressure CVD method. Two-dimensional horizontal reactor.
- 期刊名称Transactions of the Japan Society of Mechanical Engineers Series B
- 作者NANBU, KENICHI; IGARASHI, SABURO; WATANABE, YASUO
- 卷第56卷
- 期第524期
- 印刷ISSN0387-5016
- 电子ISSN1884-8346
- 文件大小475.32KB
- 发表时间1990
- DOI10.1299/kikaib.56.892
- 页码892-897
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