Challenges in Development of Sub-10 nm Resist MaterialsKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Journal of Photopolymer Science and Technology · 2016

Quencher Effects at 22 nm Pattern Formation in Chemically Amplified ResistsKozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2008

Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resistYamada, Teppei; Ishihara, Satoshi; Muroya, Yusa; Santillan, Julius Joseph; Yamashita, Shinichi; Itani, Toshiro; Kozawa, Takahiro · Japanese Journal of Applied Physics · 2019

Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm FabricationKozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Toriumi, Minoru; Itani, Toshiro · Japanese Journal of Applied Physics · 2008

Quencher diffusion in chemically amplified poly(4-hydroxystyrene- <i>co</i> - <i>t</i> -butyl methacrylate) resistKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2015

Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet ResistKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2012

Effects of effective reaction radius for neutralization on performance of chemically amplified resistsKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2014

Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resistsKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2014

Fluorinated Polyimides for Optical Applications.Matsuura, Tohru · Journal of Photopolymer Science and Technology · 1997

Amorphous chalcogenide inorganic resist.YOSHIKAWA, AKIRA · Journal of Photopolymer Science and Technology · 1994

Photopolymerizable Polyfunctional Methacrylated Polyesters.Huang, Hong; Zhang, Jiongzheng; Shi, Wenfang · Journal of Photopolymer Science and Technology · 1997

Synthesis of Photosensitive Polycarbodiimide.Mochizuki, Amane; Takeshi, Kazumasa; Haba, Osamu; Kato, Sadao; Ueda, Mitsuru · Journal of Photopolymer Science and Technology · 1998

Optical Properties of Polyalicyclic Polyimides.Matsumoto, Toshihiko; Feger, Claudius · Journal of Photopolymer Science and Technology · 1998

Plasma Polymerization of Heteroaromatic Compounds.Iriyama, Yu · Journal of Photopolymer Science and Technology · 2001

Organic Solid-State Laser.Taniguchi, Yoshio · Journal of Photopolymer Science and Technology · 2002

Investigation of Organic PhotoconductorsKuwahara, Atsushi; Naka, Shigeki; Okada, Hiroyuki · Journal of Photopolymer Science and Technology · 2007