Effect of C and B sequential implantation on the B acceptors in 4H–SiC
- 期刊名称Journal of Applied Physics
- 作者Nakano, Yoshitaka; Malhan, Rajesh Kumar; Kachi, Tetsu; Tadano, Hiroshi
- 卷第89卷
- 期第11期
- 印刷ISSN0021-8979
- 文件大小297.77KB
- 发表时间2001
- DOI10.1063/1.1359426
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