SPIE Proceedings [SPIE Micromachining and Microfabrication - San Jose, CA (Saturday 25 January 2003)] MOEMS Display and Imaging Systems - <title>Characterization of spatial light modulators for microlithography</title>Duerr, Peter; Dauderstaedt, Ulrike; Kunze, Detlef; Auvert, Marine; Bakke, Thor; Schenk, Harald; Lakner, Hubert; Urey, Hakan · 2003

SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Optomechanics 2003 - <title>Diamond-turning-assisted fabrication of a high-numerical-aperture lens assembly for 157-nm microlithography</title>Arriola, Edmund W.; Hatheway, Alson E. · 2003

SPIE Proceedings [SPIE Micromachining and Microfabrication - San Jose, CA (Saturday 25 January 2003)] Micromachining Technology for Micro-Optics and Nano-Optics - <title>Microfabrication of controlled angle diffusers used for resolution enhancement in microlithography</title>Himel, Marc D.; Poutous, Menelaos K.; Stack, Jared D.; Leonard, Jerry L.; Johnson, Eric G. · 2003

SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications - <title>Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography</title>Dinger, Udo; Seitz, Guenther; Schulte, Stefan; Eisert, Frank; Muenster, Christian; Burkart, Stefan; Stacklies, Siegfried; Bustaus, Christian; Hoefer, Hubert; Mayer, Maximilian; Fellner, Bernhard; Hocky, Oliver; Rupp, Markus; Riedelsheimer, Klaus; Kuerz, Peter; Khounsary, Ali M.; Dinger, Udo; Ota, Kazuya · 2004

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - <title>Factors influencing CD-SEM metrology</title>Sicignano, Albert; Nikitin, Arkady V.; Yeremin, Dmitriy Y.; Sandy, Matthew; Goldburt, E. T.; Herr, Daniel J. C. · 2002