Attributional bias instrument (ABI): validation of a measure to assess ability and effort explanations for math performance
- 作者Penelope P. Espinoza, Stephanie A. Quezada, Rodolfo Rincones, E. Natalia Strobach, María Armida Estrada Gutiérrez
- 卷第15卷
- 期第4期
- 文件大小285.90KB
- 发表时间2012-12
- DOI10.1007/s11218-012-9201-7
- 页码533-554
The Correlation between Water Contact Angle and KPR Adherence on SiO[sub 2] SurfacesBergh, A. A. · Journal of The Electrochemical Society · 1965
Correlation between local structure and refractive index of e-beam evaporated (HfO[sub 2]–SiO[sub 2]) composite thin filmsDas, N. C.; Sahoo, N. K.; Bhattacharyya, D.; Thakur, S.; Kamble, N. M.; Nanda, D.; Hazra, S.; Bal, J. K.; Lee, J. F.; Tai, Y. L.; Hsieh, C. A. · Journal of Applied Physics · 2010
Correlation between charge trap distribution and memory characteristics in metal/oxide/nitride/oxide/silicon devices with two different blocking oxides, Al[sub 2]O[sub 3] and SiO[sub 2]Y. J. Seo; K. C. Kim; H. D. Kim; M. S. Joo; H. M. An; T. G. Kim · 2008
Correlation Between Breakdown and Process-Induced Positive Charge Trapping in Thin Thermal SiO[sub 2]Holland, S. · Journal of The Electrochemical Society · 1986
[IEEE 2004 IEEE International Reliability Physics Symposium. - Phoenix, AZ, USA (25-29 April 2004)] 2004 IEEE International Reliability Physics Symposium. Proceedings - Correlation between Stress-Induced Leakage Current (SILC) and the HfO/sub 2/ bulk trap density in a SiO/sub 2//HfO/sub 2/ stackCrupi, F.; Degraeve, R.; Kerber, A.; Kwak, D.H.; Groeseneken, G. · 2004
Etching mechanisms of Si and SiO[sub 2] in inductively coupled fluorocarbon plasmas: Correlation between plasma species and surface etchingGaboriau, F.; Fernandez-Peignon, M-C.; Cartry, G.; Cardinaud, Ch. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2005
Correlation between Si-related and erbium photoluminescence bands and determination of erbium effective excitation cross section in SiO[sub 2] filmsKao, C.-C.; Barthou, C.; Gallas, B.; Fisson, S.; Vuye, G.; Rivory, J.; Al Choueiry, A.; Jurdyc, A.-M.; Jacquier, B.; Bigot, L. · Journal of Applied Physics · 2005
[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Strong correlation between dielectric reliability and charge trapping in SiO/sub 2//Al/sub 2/O/sub 3/ gate stacks with TiN electrodesKerber, A.; Cartier, E.; Degraeve, R.; Pantisano, L.; Roussel, P.; Groeseneken, G. · 2002
Charge transport in magnetronsRossnagel, S. M. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1987
Biomolecules and surfacesRatner, Buddy D. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1990
Studies in differential chargingBarr, Tery L. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1989
Material selection for hard coatingsHolleck, H. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1986
Hollow cathode magnetronWang, Zhehui; Cohen, Samuel A. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1999
Nanostructured materials for supercapacitorsMeyyappan, M. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2013
Design of functional coatingsHegemann, D.; Oehr, C.; Fischer, A. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2005
Depth profile optimizationNaumkin, A. V. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1994