![Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma]()
Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasmaHuang, Li-Tien; Chang, Ming-Lun; Huang, Jhih-Jie; Lin, Hsin-Chih; Kuo, Chin-Lung; Lee, Min-Hung; Liu, Chee Wee; Chen, Miin-Jang · Applied Surface Science · 2013