SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - <title>Monitoring strategy to match the advanced fabs</title>Ackmann, Paul W.; Behringer, Uwe F. W. · 2004

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - The impact of EUV mask defects on lithographic process performanceEvanschitzky, Peter; Erdmann, Andreas · 2004

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - <title>Dynamic mask defects in hot embossing lithography</title>Bogdanski, N.; Schulz, Hubert; Wissen, Matthias; Scheer, Hella-Christin; Behringer, Uwe F. W. · 2004

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Effect of electrostatic chucking on EUVL mask flatnessMikkelson, Andrew R.; Engelstad, Roxann L.; Lovell, Edward G.; Aschke, Lutz; Rueggeberg, Frauke; Sobel, Frank · 2004

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Metrological characterization of new CD photomask standardsMirande, Werner; Bodermann, Bernd; Haessler-Grohne, W.; Frase, Carl G.; Czerkas, Slawomir; Bosse, Harald · 2004

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Determining the transfer function of a mask fabrication processLeunissen, Peter L. H. A.; Philipsen, Vicky; Jonckheere, Rik M. · 2004

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - The guideline of reticle data management (Ver. 2)Iriki, Nobuyuki; Miyazaki, Norihiko; Homma, M.; Sato, T.; Onodera, Toshio; Matsuda, T.; Uga, T.; Higashino, Hidehiro; Higashikawa, Iwao; Yoshioka, Nobuyuki · 2004

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - <title>Application of lithography simulation in reticle inspection</title>Kalus, Christian K.; Wildfeuer, Robert; Behringer, Uwe F. W. · 2002